|
 PRELIMINARY PROGRAM
INTERNATIONAL SYMPOSIUM ON
ADHESION ASPECTS OF THIN
FILMS AND ADHESION
MEASUREMENT OF FILMS AND
COATINGS
To be held November 5-7, 2001 at the Robert Treat Hotel; Newark, NJ |
This symposium replaces what was originally intended to be two separate symposia dealing
with adhesion aspects of thin films and adhesion measurement of thin films and coatings.
However, tragic events associated with the destruction of the WORLD TRADE CENTER in
New York City have forced many to change their travel plans and the organizing committee
has had to respond by integrating the former two programs into one. As the two programs
are so closely related combining them presents relatively little difficulty. The first topic is
concerned with those aspects of thin film technology that have a direct bearing on film
adhesion to the substrate. It is an area of both fundamental interest to thin film technology
and of great practical concern in applications where films of high stress are involved. The
coating of diamond films onto machine tools is one of many applications where thin films
adhesion is a critical factor in coating durability. The second topic deals with the myriad
methods for measuring the adhesion of thin films and coatings. The ability to accurately
measure the adhesion of coatings to surfaces is a crucial part of the development and
manufacturing process of coatings and films. In addition, the ability to make accurate
adhesion measurements requires a fundamental understanding of the physics, chemistry
and mechanics of thin films and coatings.
The invited speakers represent widely differing disciplines and interests, and they hail from
academic, governmental and industrial research laboratories. The primary focus of this
symposium is to provide a forum for the discussion of cutting edge advancements in the
field and to review and consolidate the accomplishments which have been achieved thus
far. Please note that the address given is that of the primary speaker and may not be
correct for that of all coauthors. |
HARD COATINGS
Esteban Broitman; Thin Film Physics Division, IFM, Linköping University, SE-581 83
Linköping, SWEDEN; Hard and Elastic Carbon Nitride Films for Tribological
Applications
Tsutomu Sonoda, A.Watazu, J.Zhu, W.Shi, A.Kamiya, K.Kato and T.Asahina
National Institute of Advanced Industrial Science and Technology(AIST)
1-1, Hirate-cho, Kita-ku, Nagoya 462-8510, JAPAN; Improved Adhesion of Ti-O Film
deposited onto Titanium-based Alloy by Reactive Sputtering with Ti/O
Compositional Gradient
S.J. Bull; Materials Division, Department of Mechanical, Materials and Manufacturing
Engineering, University of Newcastle, Herschel Building, Newcastle-upon-Tyne, NE1 7RU,
UK; Assessing the Adhesion of Hard, Carbon-based Coatings
Alfred Hofrichter; Ecole Polytechnique, Paliseau, FRANCE; Distribution of Silicon
Oxynitrides on Polycarbonate by Distributed Electron Cyclotron Resonance Plasma
Enhanced Chemical Vapor Deposition
Shoji Kamiya, Hironori Takahashi, Pierangelo D'Antonio, Riccardo Polini and Enrico
Traversa; Department of Mechanical Engineering - Tohoku University, Aramaki aza Aoba 01,
Aoba-ku, Sendai 980-8579, JAPAN; Quantitative Evaluation of the Interface
Toughness Between CVD Diamond and Co-cemented Tungsten Carbide
MULTILAYERS AND INTERFACIAL PHENOMENA
G. Grundmeier, B. Schinkinger, N. Shirtcliffe, P. Thiemann, M. Stratmann; Max-Planck-Institut für Eisenforschung, Düsseldorf, GERMANY; Morphology and Chemical
Composition of Interfacial Ultra-Thin Inorganic and Organic Layers at Paint/Metal
Interfaces
A. Lahmar, D. Sakami, S. Orain, Y. Scudeller, F. Danes and T.P. Nguyen; Laboratoire de
Thermocinétique, UMR CNRS 6607, Ecole Polytechnique de l'Université de Nantes, BP 50609,
44306 Nantes cedex 3, FRANCE; Study of Adhesion and Thermal Contact Resistance of
Gold and Copper Films On Alumina Substrates
Gyeong-Su Park; Samsung Advanced Institute of Technology, P.O. Box 111, Suwon
440-600, SOUTH KOREA; Structural Analysis of Hybrid Thin Multilayers on Polymeric
Substrates Studied by Transmission Electron Microscopy
Norbert Schwesinger; Microstructured Mechatronical Systems, Munich University of
Technolgy, Arcisstrasse 21, D-80290 Munich, GERMANY; Adhesion Aspects of Thin Films
in the Field of Micro Reaction Technology
Michael Ignat; Inst. Natl. Polytechnique Grenoble, BP 75, Domaine Universitaire, F-38402
St. Martin d'Heres, FRANCE; Determination of the Elastic Parameters and of the
Tensile Strength of an Intermetallic Thin Layer Obtained by Solid State Reaction
Xingfa Ma, Yuanjun Liu, Fenghua Song , Lei Tang, Zhongping Wang and Jianguo Wang;
Shandong Institute of Non-metallic Materials, P.O.Box 108,Jinan250031, PEOPLES REPUBLIC
OF CHINA; Studies on the Interface of Rubber-to-Metal Bonded Composite with SEM
Xingfa Ma, Fenghua Song, Lei Tang, Zhongping Wang and Jianguo Wang; Shandong
Institute of Non-metallic Materials, P.O.Box 108, Jinan 250031, PEOPLES REPUBLIC OF
CHINA; Dynamical Simulation Test Studies of Metal-to-Rubber Bonding in
Vulcanization Composites
Zhiming Yu; Corrosion Science Laboratory, Inst. of Corrosion&Protection of Metals, Wencui
Rd. 62, Shenyang 110015, P. R. CHINA; Influence of Interlayers and Microstress on
Adherence of Tin Films
STRESS AND DEFECT PHENOMENA
Y. Leterrier and G. Rochat; Laboratoire de Technologie des Composites et Polymeres (LTC),
Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, SWITZERLAND;
Influence of Defects and Internal Stresses on the Adhesion of Nanosized Oxide
Coatings on Polymers
J. Bouchet and A. A. Roche; Institut National des Sciences Appliquées de Lyon, Laboratoire
des Matériaux Macromoléculaires (CNRS, UMR 5627), 20 Avenue Albert Einstein, F-69621
Villeurbanne Cedex, FRANCE; How Residual Stresses and Mechanical Properties of
Organic Coatings Applied onto Metallic Substrate Interphases: Do Affect Practical
Adhesion?
S. Scaglione, A. Rizzo, M..A. Tagliente and M. Alvisi; ENEA, New Material Division, CR
Brindisi, S.S.7 Appia Km 712, 72100 Brindisi, ITALY; A Study of Intrinsic Residual Stress
in Silver Films Deposited by RF Magnetron Sputtering