ANNOUNCEMENT AND PRELIMINARY PROGRAM
	INTERNATIONAL SYMPOSIUM ON SURFACE CONTAMINATION AND CLEANING: May 24-25, 2001 ROBERT TREAT HOTEL NEWARK, NJ
This symposium continues the tradition set by its progenitor "Surface Contamination: Genesis, Detection and Control" which was held in Washington DC in 1978. As with its predecessor, this symposium will be concerned with the technological areas where surface cleaning is of cardinal importance such as adhesion, composites, adsorption, friction, lubrication, soldering, device fabrication and precision machine parts to name just a few where surface contamination has always been a fiendish adversary. This symposium is organized to bring together scientists, technologists and engineers interested in all aspects of surface contamination, to review and assess the current state of knowledge, to provide a forum for exchange and cross-fertilization of ideas and to define problem areas which need intensified efforts. Both particulate and film type contaminants will be covered. Finally, cleaning methods for all kinds of surfaces (glass, metals, plastics,... etc.) are within the purview of this symposium. It is planned to chronicle the transactions in a hard-bound volume of archival quality (to match or exceed the standards of the journal literature) which will serve as a reference work for future generations of investigators. Note, the address given is for the presenting author only.

LASER AND RADIATION ASSISTED REMOVAL

Susan Davis Allen and Kamran Imen; Department of Chemistry, Florida State University, Tallahassee, FL 32306-4390; Laser Assisted Particle Removal

Bill Metzger; Ushio America, Inc., 5440 Cerritos Avenue, Cypress, Ca 90630; The Application of Excimer Lamps in the Cleaning and Conditioning of Surfaces

Mario M. Mosbacher; University of Konstanz, Center of Modern Optics, Fach M676, D-78457 Konstanz ,GERMANY; Laser Cleaning of Particles on Surfaces: Prospects and Problems

V. Zharov and B. Lakinsky; Odessa Institute of Technology; Odessa, UKRAINE; Surface Cleaning of Inorganic Materials from Thin Organic Films by Ion Bombardment in Glow Discharge

CLEANING FOR MICROELECTRONICS

Michael T. Andreas; Micron Technology, Inc., Fab 4 Wet Process/ ms 306, 8000 S. Federal Way, Boise ID 83707-0006; Slurry Removal from Blanket Wafers: a Useful Tool for Post-CMP Cleans Process Development

Cao Baocheng, Yu Xinhao, Ma jin, and Ma Honglei; Institute of Optoelectronic Materials & Device, Shandong University , Jinan, 250100, CHINA; Surface of Silicon Chemical composition Cleaning Using Clean Solutions With Surfactants and Chelates

Christopher Beaudry and Steven Verhaverbeke; Applied Materials, 974 E. Arques Ave.,Santa Clara, CA, 94086; Investigation of Modified SC-1 Solutions

Thomas Liew and Soon Yeng Chan; Data Storage Institute, 5 Engineering Drive 1, Singapore 117608, SINGAPORE; Corrosive Effect of Microcontaminants from Plastic and Polymeric Components in Hard-Disk Drives

Lewis Liu, Mattson Technology Wet Division, 150 Oaklands Boulevard, Exton, PA 19341;

Post CMP Cleaning by a Developed Wet Process on Matton's OMNI™ System

Rajiv Kohli; Maxtor Corporation, 2190 Miller Drive, Longmont, CO 80503; Surface Contamination and Precision Cleaning in Hard Disk Drive Fabrication

Moshe Olim; Seagate Technology, 7801 Computer Avenue South, Bloomington, MN 55435; Spatial and Temporal Scales in Wet Processing of Deep Submicron Features

Werner Zapka; XaarJet AB, Box 516, Elektronikgrand 10, SE-175 26 Jarfalla - Jakobsberg, SWEDEN; Steam Laser Cleaning of Lithography Masks

ANALYTICAL STUDIES

Adam Barylski; Technical University of Gdansk, Faculty of Mechanical Engineering, G. Narutowicza 11/12, 80-952 Gdansk, POLAND; Contamination of Cast Iron Lapping Surfaces By Abrasive Micrograins

W. Birch, S. Mechken, and A. Carré; Corning S.A., Fontainebleau Research Center, 7 bis Avenue de Valvins, 77210 Avon, FRANCE; Influence of Cleaning on the Surface of Model Glasses

Mantosh Chawla; Photo Emission Tech, Inc., 3255 Grande Vista Drive, Newbury Park, CA 91320; How Clean Is Clean? Monitoring Cleanliness and Defining Acceptable Cleanliness Levels

Adam Feiler and John Ralston; Ian Wark Research Institute, University of South Australia, Mawson Lakes, S.A. 5095; Fine Particle Detachment Studied by Reflectometry and Atomic Force Microscopy

Bernhard Klumpp; Fraunhofer Institut (IPA), Nobelstrasse 12, D-70563 Stuttgart, GERMANY; SCC- The Surface Contamination Counter - a New Method for Counting Contamination on Technical Surfaces

CLEANING METHODS AND QUALITY CONTROL

Rajiv Kohli and John Durkee; Flo-Matic Corp., 1982 Belford N. Drive, Belvidere, IL 61008; Cleaning Particles from Parts by Adding Soil!

Barbara Kanegsberg and Edward Kanegsberg; BFK Solutions, 16924 Livorno Drive, Pacific Palisades, CA 90272; Impact of Newer Cleaning Agents on Contamination Control and Surface Quality

Herbert Kaiser; STERIS Corporation, P.O. Box 147, St. Louis, MO 63166; Methods for Pharmaceutical Cleaning Validations

Robert Kaiser and Kyle Haraldsen; Entropic Systems, Inc., Winchester, MA 01890;

Decontamination of Sensitive Equipment

Raman Krk; DM (FAC), Semiconductor Complex Ltd, Phase VIII Industrial Area, Punjab 160059, INDIA; Avoidance of Contamination by Humans in Class Level Clean Rooms

V. E. Skurat, N. G. Beriozkina, A. V. Volkov, I. O. Leipunsky, P. A. Pshechenkov, P. V. Samsonov, G. D. Tantsyrev, V. P. Toropov, S. A. Demidov, S. V. Naumov, and S. P. Sokolova Institute of Energy Problems of Chemical Physics, Russian Academy of Sciences, Moscow, RUSSIA; Surface Contaminations of The Space Station "Mir"